National Repository of Grey Literature 9 records found  Search took 0.01 seconds. 
Microfluidic systems in silicon technology
Juránek, Dominik ; Fecko, Peter (referee) ; Gablech, Imrich (advisor)
This thesis is devoted to the topic of microfluidics and the functionality of microfluidic devices when working with blood. It further focuses on the use of microfluidic devices to cut blood cells. The first part of this work is dedicated to the theoretical background of microfluidics, it briefly introduces the history of microfluidic devices and the materials used for their integration, moreover, it talks about the methods used when constructing a microfluidic device in a silicon substrate. Lastly, this section includes a description of blood and its composition and some properties important for working with microfluidic devices. The practical part is concerned with the (manufacturing procedure of) creating a microfluidic and testing of device that can cut red blood cells.
Optimization of deep reactive ion etching process
Houška, David ; Hrdý, Radim (referee) ; Prášek, Jan (advisor)
This bachelor thesis deals with optimization of cryogenic and Bosch deep reactive ion etching (DRIE) processes. The thesis describes characterization of silicon etching methods, the principle of DRIE and the influence of individual parameters on the resulting etch profile. Based on the analysis of fabricated samples using scanning electron microscopy (SEM), both processes were optimized to create narrow microstructures with diameters ranging from 1 to 16 µm with the highest achieved depth-to-width ratio of 28:1 on a silicon substrate. Furthermore, surface roughness was analyzed using atomic force microscopy (AFM) and the presence of fluorine residues by X-ray photoelectron spectroscopy (XPS) in structures etched by both processes.
Mechanical and optical design of spectroscopic system for reactive ion etching system
Šilhan, Lukáš ; Dostál, Zbyněk (referee) ; Šerý, Mojmír (advisor)
Measurement of absorption spectra of plasma during reactive ion etching enables characterization of etched species and control over the etching process. Aim of this diploma thesis is to design spectroscope with Czerny-Turner configuration for reactive ion etching system. Developed spectroscope achieves 1 nm resolution in 350-800 nm range. Device was tested during reactive ion etching of silicon.
Fabrication and testing of MEMS device components for micromanipulation
Binková, Petra ; Prášek, Jan (referee) ; Liška, Jiří (advisor)
This diploma thesis deals with the production and testing of MEMS devices intended for micromanipulations with a possibility of their usage in a scanning electron microscope, which includes manipulation of microobjects such as metal microparticles, microfibres or even biological samples. The first chapter contains a detailed study of microsystems and MEMS devices. The next chapter describes various types of micromanipulations, including MEMS. The third chapter deals with possible techniques of microfabrication. The fourth chapter contains experimental part of this work, in which two versions of silicon microgrippers were proposed. Considering available solutions of micromanipulators, principal and spatial limitations in the electron microscope, the piezoelectric actuator was chosen as the gripping principle. Direct write laser lithography and deep reactive ion etching were used to produce the microgrippers, and it was necessary to optimize these techniques for selected application. During the optimizations, various problems were solved, including the elimination of black silicon formation, unsuccessful etching of narrow deep structures, etc. Prototype of one of the proposed microgripper was successfully created. The manufactured micromanipulators were subsequently tested under an optical microscope. During testing, it was necessary to modify the position of the actuator in the device to ensure that the jaws of the manipulator are clamped.
A microfluidic platform for working with biological material
Vírostko, Ján ; Švarc, Vojtěch (referee) ; Hrdý, Radim (advisor)
Táto bakalárska práca sa zameriava na návrh a výrobu mikrofluidej platformy určenej pre lýzu buniek a ich následnú analýzu. Táto platforma by mala byť schopná efektívne mechanicky rezať bunky v preparátoch červených krviniek a následne ich analyzovať pomocou dvojelektródového elektrochemického systému. Teoretická časť tejto práce je zameraná na technológiu laboratória na čipe a používané komponenty v tejto technológií, ako napríklad mikrofluidné separátory, mixéry, komory určené na lýzu alebo mikroreaktory, ich aplikáciu a na koniec ich výrobu v čistých priestoroch. Taktiež je časť venovaná stručnej rozprave o fyzike prúdenia tekutín v mikroskopických kanáloch. Praktická časť tejto práce sa skladá z návrhu, výroby v čistých priestoroch a zapúzdrenia troch typov spomínanej platformy pomocou polymeru Parylene C. Následne je popísaná príprava zariadení na testovanie a ich následne testovanie. Na záver je uvedená dokumentácia výroby pomocou vytvárania snímkov s použitím elektrónového mikroskopu a grafické závislosti vypočítané počas charakterizácie elektród a snímky správania sa analytu v komore na lýzu.
Microelectromechanical through-silicon vias
Dulák, Radovan ; Hrdý, Radim (referee) ; Prášek, Jan (advisor)
Through-hole silicon vias are key technology enabling 3D system integration and thus creating compact devices. These vertical microstructures interconnect multiple layers and are also used in integrated circuits and MEMS devices. This bachelor‘s thesis focuses on the possibility of preparing these microjunctions by wet anisotropic etching and dry anisotropic etching using the deep reactive ion etching (DRIE) process for use in MEMS. The work shows preparation, etching, plating and galvanic filling of these structures. Using optical and scanning electron microscope (SEM) images, experimental tests and subsequent optimization were performed and evaluated to create a hole with a minimum size of approximately 1 m using a wet etching process and 16 m by a dry etching process. The highest achieved aspect ratio on a wafer was 15:1. In addition, the created holes were plated, galvanically filled with conductive material and electrically tested and measured.
Microfluidic systems in silicon technology
Juránek, Dominik ; Fecko, Peter (referee) ; Gablech, Imrich (advisor)
This thesis is devoted to the topic of microfluidics and the functionality of microfluidic devices when working with blood. It further focuses on the use of microfluidic devices to cut blood cells. The first part of this work is dedicated to the theoretical background of microfluidics, it briefly introduces the history of microfluidic devices and the materials used for their integration, moreover, it talks about the methods used when constructing a microfluidic device in a silicon substrate. Lastly, this section includes a description of blood and its composition and some properties important for working with microfluidic devices. The practical part is concerned with the (manufacturing procedure of) creating a microfluidic and testing of device that can cut red blood cells.
Optimization of deep reactive ion etching process
Houška, David ; Hrdý, Radim (referee) ; Prášek, Jan (advisor)
This bachelor thesis deals with optimization of cryogenic and Bosch deep reactive ion etching (DRIE) processes. The thesis describes characterization of silicon etching methods, the principle of DRIE and the influence of individual parameters on the resulting etch profile. Based on the analysis of fabricated samples using scanning electron microscopy (SEM), both processes were optimized to create narrow microstructures with diameters ranging from 1 to 16 µm with the highest achieved depth-to-width ratio of 28:1 on a silicon substrate. Furthermore, surface roughness was analyzed using atomic force microscopy (AFM) and the presence of fluorine residues by X-ray photoelectron spectroscopy (XPS) in structures etched by both processes.
Mechanical and optical design of spectroscopic system for reactive ion etching system
Šilhan, Lukáš ; Dostál, Zbyněk (referee) ; Šerý, Mojmír (advisor)
Measurement of absorption spectra of plasma during reactive ion etching enables characterization of etched species and control over the etching process. Aim of this diploma thesis is to design spectroscope with Czerny-Turner configuration for reactive ion etching system. Developed spectroscope achieves 1 nm resolution in 350-800 nm range. Device was tested during reactive ion etching of silicon.

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